Mr. Seung-Goo Kim will present his MSc Thesis work on May 4th at 15.00 (zoom link here).
Few details about the thesis:
Title: Ion beam trimming of aluminium nitride thin film with silicon dioxide mask
Abstract: The field of Seung-Goo Kim’s work is microelectromechanical systems (MEMS), focused on micro/nano fabrication. The main goal of his work was to develop a fabrication process for creating lithographically defined etched-back recesses or applying film thickness correction by ion beam trimming technique (Argon ion milling system) in lithographically defined areas with thickness accuracy in the order of +/-1 nm. The presentation will include two main chapters mainly: 1. The fabrication process development; 2. The suggestion of hypotheses concerning a reduced etching rate. In the first chapter, two issues which were observed during the development will be covered, presenting solutions of each issue. In the second chapter, three hypotheses will be suggested as well as their experimental results.